| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation apparatus which can preferably correct a formation abnormality of a pattern by the generation of a discharge abnormality nozzle when a pattern is formed by depositing a functional material on the marginal part of a line of liquid formed by a droplet discharge device and a pattern formation method.SOLUTION: A pattern formation apparatus, which forms patterns containing functional materials by giving a plurality of liquid droplet sets, containing functional materials given out of a plurality of nozzles 9a-d to pixel sets arranged in parallel with a direction of a nozzle array, in a direction crossing the direction of the nozzle array while a droplet discharge device 4 having the plurality of nozzles 9a-d is relatively moved to a substrate 1 to form a line of liquid 2 with the plurality of liquid droplet sets unified, and to deposit functional materials on a marginal part when drying the liquid, has a control part that corrects pattern formation abnormality, the control part changing a liquid droplet discharge condition based on fundamental liquid droplet discharge condition data upon normality to a liquid droplet discharge condition based on corrected liquid droplet discharge condition data when a discharge abnormality nozzle is detected.SELECTED DRAWING: Figure 4 |
