| 摘要 |
PURPOSE:To provide the solvent which contains a quinone diazide photosensitive material having solubility of a resist and particularly high esterification degree, has excellent solubility of a positive type photoresist, is extremely high in safety, has the solubility stable with lapse of time and does not generate residues and deposits. CONSTITUTION:This solvent for washing and removing the resist consists of a beta type propylene glycol monoalkyl ether acetate solvent alone or a solvent contg. this solvent as an essential component. A coating material for forming the resist is applied on a base material by a spinner and the unnecessary coating material for forming the resist sticking to the peripheral parts, edge side part and rear surface parts of the base material is previously removed by this solvent for washing and removing the resist and thereafter, the base material is subjected to a drying treatment, by which the base material for production of electronic parts is produced. |
