PHOTOSESITIVE MATERIALS FOR PHOTORESIST

摘要

The positive photoresist is useful for integrated circuits in microelectronic devices due to the good resolution and contrast. The positive photoresist consists of (A) 10-50 % quinonediazide group as a photoactive material; (B) 20-90 % mixture of cresol novolac resin and polyhydroxy stylene as resin binder; (C) 0-10 % additives.