| 摘要 |
PURPOSE:To further enhance the alignment precision of a projected image by a method wherein a sensitive substrate is aligned according to the parameter errors decided to minimize the measured plural slips. CONSTITUTION:The first and second images are previously overlapped or connected to form on a sensitive substrate 11. Next, the positional slips of the first and second images on the sensitive substrate 11 are measured on plural positions on the sensitive substrate 11. Next, the parameter errors are decided so as to minimize the measured plural positional slips according to the reference position when the reference is projected on the sensitive substrate 11 through the intermediary of a projection optical system 17 as well as a pattern position on a mask 20. Finally, the sensitive substrate 11 is aligned according to the decided parameter errors. Through these procedures, the alignment precision of exposure position can be enhanced. |
