| 摘要 |
PURPOSE:To provide a vertical scanning type X-ray aligner which can accurately position by an effective and stable operating mechanism. CONSTITUTION:The aligner comprises stages XS, Y1S, Y2S movable in a direction including a vertical component, and means for relatively scanning the stages to an X-ray EX of parallel luminous fluxes to be substantially introduced from a horizontal direction, and exposes a wafer by scanning exposure. In this case, the wafer and a mask are held substantially integrally, and the mask and the wafer are fed at a constant speed to the fluxes thereby to expose to transfer a mask pattern to the wafer. |
