发明名称 NEGATIVE TYPE RADIATION SENSITIVE RESIN COMPOSITIN AND PATTERN FORMING METHOD
摘要 PURPOSE:To enhance sensitivity, film remaining rate, and resolution by using an aqueous alkali-soluble resin having vinylphenol structures, a cross-linking agent of alkoxymethylated benzoguanamine resin, and a specified photo acid generator. CONSTITUTION:The aqueous alkali-soluble resin has the vinylphenol structures obtained radically polymerizing vinylphenols, such as 4-vinylphenol, by using a polymerization initiator, and the cross-linking agent is the alkoxymethylated guanamine resin, obtained by converting benzoguanamine into N-methylol by sodium hydroxide or the like and allowing lower alcohol to react with it, and the photo acid generator is a compound represented by the formula in which X is H or Br.
申请公布号 JPH0792676(A) 申请公布日期 1995.04.07
申请号 JP19930256336 申请日期 1993.09.21
申请人 NIPPON KAYAKU CO LTD 发明人 KOYANAGI TAKAO;KITAORI TOMOYUKI;FUKUNAGA MASANORI;NAGASAWA KOTARO
分类号 G03F7/004;G03F7/029;G03F7/038;G03F7/38;H01L21/027;(IPC1-7):G03F7/038 主分类号 G03F7/004
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