| 摘要 |
PURPOSE:To provide a method and device for treating substrates by which a chemical can be maintained at a constant temperature even when the treatment of a substrate is interrupted. CONSTITUTION:A substrate treating method in which a chemical maintained at a constant temperature through a heat exchanger is supplied to substrates. In the method, impurities are removed from the chemical by filtration at a temperature while the chemical is maintained at the constant temperature in the heat exchanger and the filtered chemical is discharged to the surface of a substrate. In addition, a substrate treating device which supplies the chemical maintained at the constant temperature to the substrate 10 through a discharge port 8 is provided with the heat exchanger 2 constituted by mounting a coiled pipe 3 for heat exchange in a tank 4 in which constant-temperature water is circulated, filter 6 connected to the pipe 3 and installed in the tank 4, and chemical temperature maintaining mechanism 11 between the outlet of the heat exchanger 2 and discharge port 8 of the chemical. |
