| 摘要 |
PURPOSE:To perform exposure by arranging a pupil filter in the vicinity of the pupil surface of a projecting optical system as required at the time of exposure and to avoid adverse effects on an alignment system and the like, which perform position detection and the like through the projecting optical system. CONSTITUTION:When the pattern of a reticle 16, wherein a contact-hole pattern is formed, is projected on a wafer 8, a pupil filter 43 is provided in the vicinity of the pupil surface of a projecting optical system 5. When the laser beams from TTL-type alignment systems 28X and 28Y are cast on the wafer 8 through the projecting optical system 5 and the position of wafer marks WMX and WMY on the wafer are detected, the pupil filter 43 is retracted from the vicinity of the pupil surface of the projecting optical system 5. |
