发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To eliminate secular change of sensitivity and to enhance safety by dissolving an alkali-soluble resin and a compound having a quinonediazido group with a specified solvent or a mixture with another solvent. CONSTITUTION:The alkali-soluble resin and the compound having the quinonediazido group are dissolved in a single solvent of an alkyl L(+) type alpha-oxypropionate or a solvent mixture with another solvent. As the alkali-soluble resin, novolak resins, acrylic resins, styrene-acrylic copolymers, hydroxystyrene polymers, polyvinylphenols, poly-alpha-methylphenols, and the like are enumerated, and alkali-soluble novolak resins are especially preferred. As the photosensitive component, the compounds each having the quinonediazido group, preferably, esters of sulfonic acids with polyhydroxy compounds are used.
申请公布号 JPH07230164(A) 申请公布日期 1995.08.29
申请号 JP19940021047 申请日期 1994.02.18
申请人 TOKYO OHKA KOGYO CO LTD 发明人 MARUYAMA KENJI;ITO YASUSHI;ONO ISATO;TOKUTAKE NOBUO;OBARA HIDEKATSU;NAKAYAMA TOSHIMASA
分类号 G03F7/022;G03F7/004;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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