Metall-Halbleiter-Diode und Verfahren zur Herstellung von Metall-Halbleiter-Dioden

摘要

For a metal semiconductor diode the invention proposes to grow the depletion layer of constrained InxGa1-xAs epitaxially, with increasing indium content x in the direction of the metal contact, and/or to delimit a diode region by surrounding insulation areas in a planar structure consisting of a sequence of layers, with the metal contact situated on the surface of the layer sequence. Advantageous production methods are indicated therefor.