| 摘要 |
PURPOSE:To obtain an alignment mark which can be aligned saisfactorily even when overlap-requirement margins for a next process pattern with reference to a plurality of existing patterns are different. CONSTITUTION:An alignment mark 2 is constituted of a divided mark part 2a which is formed simultaneously with the formation of a first-layer pattern 1a and of divided mark parts 2b which are formed simultaneously with the formation of a second-layer pattern 1b. It is assumed that a relationship of 2 (a)=(b) is established between overlap-requirement margins (a), (b) with reference to the patterns 1a, 1b of a third-layer pattern 1c. Then, the mark 2 is constituted of a plurality of rod-shaped parts so that the mark part 2a occupies 2/3 and that the mark parts 2b occupy 1/3. When the pattern 1c is formed, the mark parts 2a, 2b are detected so as to be weighted according to their number, and an alignment position is decided. |
