| 摘要 |
PURPOSE:To provide a photosensitive compound which bears a quinone diazide group, shows good sensitivity to light and can form a good pattern on a flexibly curved face structure or twisted structure. CONSTITUTION:This compound is expressed by the formula (R1 is a 1-100C hydrocarbon; ester linkage, ether linkage, amide linkage, urethane linkage, Si, N; M is quinone diazide). This compound is obtained by reaction of a mono- or polyhydric alcohol with an epihalohydrin to give an epoxy group-bearing compound followed by reaction of the epoxy compound with a hydroxybenzoic acid or an aminophenol to give a phenolic structure-having compound, finally reaction of the phenolic hydroxy group in the product with a quinone diazide. This compound is useful as a material for resists and printing. Particularly, the pattern formation using this compound can be applied to flat, uneven and curved surfaces because there happens no defect caused by cracking on the curved surface, when it is applied to a curved face and twisted face structures. |
