| 摘要 |
PURPOSE: To prevent the omission due to cracking even when a pattern is formed on a curved or twisted structure and to make a photosensitive compsn. applicable to a rugged or curved surface as well as a plane surface by using a specified photosensitive compd. having a quinone-diazido group as a photosensitive component. CONSTITUTION: This photosensitive compd. has a structure represented by formula I, II or III. In the formulae I-III, each of R1-R4 is a 1 to 100C optionally substd. hydrocarbon group which may contain an ester bond, an ether bond, a thio-ether bond, an amido bond, a urethane bond, a urea bond, Si and N, M is a quinonecliazido group, >=20% of carbon atoms forming the skeleton of each of R1 and R2 do not belong to an arom. ring and >=20% of carbon atoms forming the skeleton of at least one of R3 and R4 do not belong to an arom. ring. This photosensitive compd. is softer and more excellent. in pattern forming property than a photosensitive compd. using phenol-novolak resin. |
