| 摘要 |
PURPOSE: To impart low-temp. oxidation preventing capability to an MoSi2 material. CONSTITUTION: A dense protective coating film of Cr, Ni, Rh, Ir, Pt or Au having >=0.1μm thickness and excellent in oxidation resistance is formed on an MoSi2 substrate preferably by thermal spraying, plating or ion plating. A thermally sprayed Al film may further be formed on the protective coating film. Even in the case of low density of MoSi2 , MoO3 is not produced even by exposure to the air at 450 deg.C for >=300hr.
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