| 摘要 |
PURPOSE: To obtain a photosensitive film excellent in work efficiency, resolution and adhesion. CONSTITUTION: This photosensitive film has a practically transparent substrate film, a photosensitive resin layer and a protective film. The thickness of the substrate film is 12-18μm and the haze is 0.1-1.5%. The thickness of the photosensitive resin layer is 10-20nm and the absorbance at 365nm is 0.7-1.5. |
