| 摘要 |
PURPOSE: To wash wafers so as to prevent particles from remaining on the wafers after washing. CONSTITUTION: In a wafer washing apparatus, a step of ejecting a washing soln 3 from the bottom of a washing tank 1 to allow the same to overflow from the upper part of the tank and a step of discharging the washing soln. from the lower part of the tank 1 are repeated at least once to wash a plurality of the wafers 5 supported on a wafer support device 6 in parallel. Therefore, the drain valve 4 of the washing soln. 3 is provided to the washing tank 1 so that the lower part of at least one side wall 1b crossing the direction parallel to the surfaces of the wafers 5 of the washing tank 1 is opened and a wafer washing method is constituted so as to repeatedly perform the ejection/overflow→discharge of the washing soln. 3 at least once.
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