| 摘要 |
<p>PURPOSE: To provide a substrate stage in which a substrate mounted within a predetermined mounting section without running on a guide wall can be confirmed. CONSTITUTION: A substrate stage 40 is provided in a parallel flat plate electrode type plasma etching device. The substrate stage is provided with a horizontal substrate mounting surface 38 having a guide wall 36 projecting in the periphery of a predetermined mounting section S, and further is provided with four pieces of displacement detecting sensors 42A to 42D flush with the substrate mounting surface 38 of the substrate stage 40, which are provided at equal intervals on an arrangement limiting line L provided in the inner part by an allowable distance from the inner edge of the guide wall 36 along the inner edge. The displacement detecting sensors 42 are a photo-sensor capable of detecting plasma light emission generated in the etching device. The respective lead wires of the displacement detecting sensors 42A to 42D pass through through-holes 44A, 44C which pass through the substrate stage 40 and are connected to an alarm device.</p> |
