Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages

摘要

This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.

主权项

1. A pulsed DC power supply system configured to provide pulsed DC power to a plurality of anodeless electrodes of a plasma processing chamber, the pulsed DC power supply comprising:
a pulsed DC power supply system coupled to and providing a DC current via a first and second rail; a voltage-boosting circuit coupled between the first and second rail and comprising:
a first diode coupled between the first rail and a first electrical node, an anode of the first diode being at a voltage of the first rail;a voltage multiplier coupled between the second rail and the first electrical node, the voltage multiplier having an output;a first inductive element coupled between the first rail and a second electrical node;a first switch coupled between the first and second electrical nodes and selectively discharging a portion of a voltage stored in the voltage multiplier through the first inductive element to the first rail;a second diode coupled between the first rail and a third electrical node, an anode of the second diode being at a voltage of the third electrical node; anda second inductive element being coupled between the output of the voltage multiplier and the third electrical node; a switching circuit coupled to the first and second rails and receiving the DC current via the first and second rails and generating a pulsed DC voltage, the switching circuit having first and second outputs configured to provide the first pulsed DC voltage to at least first and second anodeless electrodes of the plasma processing chamber.