| 摘要 |
PURPOSE: To provide a measuring method for superposing accuracy that is not limited by sort of superposed regions. CONSTITUTION: A substrate 12 includes a superposed region 5, a photosensitive material pattern 6, a peripheral region 7, and electrodes 8-11. The peripheral region 7 is formed through a doping process and a step forming process prior to a superposed region 5 forming process. A mask is superposed on the superposed region 5, which is a doped region formed through the precedent process. Here, the position of the superposed region 5 and that of the photosensitive material pattern 6 are recognized by different methods based on different principles. |
