Halbleitereinrichtung und Verfahren zu deren Herstellung,申请号DE19924228679-传众专利搜索

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发明名称	Halbleitereinrichtung und Verfahren zu deren Herstellung
摘要
申请公布号	DE4228679(C2)	申请公布日期	1997.01.09
申请号	DE19924228679	申请日期	1992.08.28
申请人	MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP	发明人	MOTONAMI, KAORU, ITAMI, HYOGO, JP
分类号	H01L21/28;H01L21/225;H01L21/283;H01L21/285;H01L21/314;H01L21/768;H01L23/522;H01L23/532;(IPC1-7):H01L23/522;H01L21/822;H01L27/108	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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