发明名称 |
Semiconductor memory device and method of manufacturing semiconductor memory device and method of layouting auxiliary pattern |
摘要 |
According to one embodiment, a semiconductor memory device includes a semiconductor substrate, which includes thereon a first region where memory elements are arranged and a second region where circuit elements driving the memory elements are arranged. The first region is provided with a stacked body including a plurality of metal films. Further, the stacked body is divided into a plurality of parts by first separation portions extending in a first direction. The second region is provided with an auxiliary pattern, which includes the stacked body together with a separation portion pair including a pair of second separation portions that divide the stacked body. The second separation portions extend in a second direction intersecting with the first direction. |
申请公布号 |
US9455271(B1) |
申请公布日期 |
2016.09.27 |
申请号 |
US201514965159 |
申请日期 |
2015.12.10 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Setta Yuji |
分类号 |
H01L29/792;H01L27/115;H01L23/00;H01L27/02;G06F17/50 |
主分类号 |
H01L29/792 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P |
主权项 |
1. A semiconductor memory device comprising a semiconductor substrate, which includes thereon a first region where memory elements are arranged and a second region where circuit elements driving the memory elements are arranged,
wherein the first region is provided with a stacked body including a plurality of metal films, the stacked body being divided into a plurality of parts by first separation portions extending in a first direction, and the second region is provided with an auxiliary pattern, which includes the stacked body together with a separation portion pair including a pair of second separation portions that divide the stacked body, the second separation portions extending in a second direction intersecting with the first direction. |
地址 |
Minato-ku JP |