| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a fluororesin molding having good antistatic properties and extremely low staining properties while keeping characteristics specific to fluororesin by forming a specific antistatic layer on the surface of a fluororesin substrate not containing an ion exchange group. SOLUTION: An ion exchange group (preferably a perfluorosulfonic acid group) is included in the surface layer of a substrate comprising a fluororesin not containing an ion exchange group (preferably perfluorocarbon-based resin such as polytetrafluoroethylene) to provide an antistatic layer comprising a fluororesin whose surface resistivity is controlled to <=10<13>Ω. The concentration of ion exchange group in the fluororesin constituting the antistatic layer is preferably 0.25-18mol%. The thickness of a layer containing 0.25-15mol% ion exchange group is preferably >=10μm. This molding is preferably obtained by fusing, e.g. a fluororesin having a group capable of exchanging to the ion exchange group onto the surface of the fluororesin molding not containing the ion exchange group and converting the exchangeable group to the ion exchange group.</p> |
