| 摘要 |
PROBLEM TO BE SOLVED: To produce a new polymer, having tristannylene groups and arylene groups or heteroarylene groups in a recurring unit, nearly completely decomposable by irradiation of light in a visible light region for several hr and useful as a photoresist material. SOLUTION: This polymer has a recurring unit of formula I [R<1> to R<6> are each a (substituted)aliphatic, aromatic or heterocyclic group; A is an arylene or a heteroarylene] and >=1×10<3> weight-average molecular weight. Furthermore, the objective polymer is obtained by reacting a compound of formula II with a compound of the formula, R<5> R<6> SnE2 (E is amino group having two aliphatic, aromatic or heterocyclic groups and the aliphatic groups, together with N atom to which the group are bonded, are capable of forming a 5- to a 6-membered ring when E is the amino group having the two aliphatic groups), e.g. at 1:1 mixing molar ratio and 20-100 deg.C in an organic solvent such as toluene.
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