发明名称 JIG FOR SURFACE TREATING SEMICONDUCTOR
摘要 <p>PROBLEM TO BE SOLVED: To secure semiconductor laser wafers cleaved into bars and spacers alternately onto a plate having a window in order to form an optical membrane easily on the edge of semiconductor laser wafer without causing any damage. SOLUTION: In the jig for surface treating a semiconductor, semiconductor laser wafers 5 cleaved into bars and spacers 6 are arranged alternately on the notched part 4 of a holding base 3 disposed at the window part 2 of a body 1. The semiconductor laser wafers 5 and spacers 6 are secured while being pressed by means of the holding base 3 and a securing jig 7. Subsequently, an optical membrane is formed on the end face of semiconductor wafer 5.</p>
申请公布号 JPH0983072(A) 申请公布日期 1997.03.28
申请号 JP19950232780 申请日期 1995.09.11
申请人 DENSO CORP 发明人 NISHI KAZUYA;KIMURA YUJI;SAKURAGI MOTOHARU;TAKAGI MAMORU;KANAMORI KATSUHIKO
分类号 G02B1/10;H01L21/68;H01L21/683;H01S5/00;H01S5/02;(IPC1-7):H01S3/18 主分类号 G02B1/10
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