发明名称 SELECTIVE DEPOSITION MODELING METHOD AND APPARATUS FOR FORMING THREE-DIMENSIONAL OBJECTS AND SUPPORTS
摘要 <p>Methods of manipulating data in a thermal stereolithography apparatus, characterized in that the data represents a plurality of start/stop transitions to facilitate the computation of Boolean operations.</p>
申请公布号 WO1997011837(A1) 申请公布日期 1997.04.03
申请号 US1996015639 申请日期 1996.09.27
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