| 摘要 |
PROBLEM TO BE SOLVED: To obtain a lenslet array for an image sensor having an improved lenslet forming layer by providing the surface of a substrate or the layer on the substrate with a polyester lenslet forming layer including a repeating unit of a specific structure. SOLUTION: This method consists of respective stages for providing the surface of the substrate or the layer on the substrate with the transparent polyester lenslet forming layer partially including the repeating unit of the structure of formula I, forming a thin etching stop layer on the lenslet forming layer, patterning this etching stop layer so as to form a mask correspond to the lenslets, subjecting the lenslet forming layer to anisotropic plasma etching according to the patterns and removing the etching stop mask and thermally refluidizing the patterned transparent layers so as to form the lenslets. The lenslet to collect light and to focus the light onto the photosensitive element of an electron image device is produced. In the formula, n denotes >=2; X is selected from H, CH, etc., Z is selected from O, S, formula II, etc. |
