PRODUCTION OF ACTIVE MATRIX SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To obtain an active matrix type liquid crystal display device with good image quality at a low cost. SOLUTION: A base insulating film 2 is formed by sputtering Ta with addition of N on a substrate 1. Then a Ta film 3 with addition of N is formed by sputtering on the base insulating film 2 and patterned into a lower electrode. Then the Ta film 3 is subjected to anodic oxidation to form a TaOx film 4. Then a Cr film 5 is formed thereon by sputtering and patterned to form an upper electrode. Further, an ITO film 6 is formed by sputtering and patterned to form pixel electrodes which are connected to the Cr film 5.