DEVICE FOR COATING A SUBSTRATE SURFACE

摘要

Device containing a vacuum chamber 30 and situated therein a substrate 10 an d a vaporisation crucible 22 filled with inorganic materials 24. Situated in the region of the vacuum chamber 30 is an electron beam or laser gun 26, the electron or laser beam 27 of which is directed at the crucible 22. The device is employed for coating a s ubstrate surface 18 e.g. a plastic film with a thin coating of inorganic materials, such as e .g. silicon oxides, by vapour deposition of the inorganic materials 24. The electron or laser beam 27 of the electron beam or laser gun 26 is direct ed at the surface of the inorganic materials 24 in the vaporising crucible 22. The electron or laser beam 27 forms an angle .alpha. of 10 to 80.degree. to the surface of the inorganic m aterials 24. On vaporising the inorganic materials 24 an overhang 25 is formed in the inorganic materia ls 24 and, geometrically, there is no line of sight between the vaporising inorganic ma terials and the substrate surface 18. The process performed in the device leads to substrates e.g. plastic films t he surfaces of which exhibit no inhomogenieties such as sprayed material, particles or drop lets of inorganic materials.