| 摘要 |
PROBLEM TO BE SOLVED: To enable a highly sensitive and highly reliable pattern inspection in a short time by comparing an image data of a pattern actually generated wire another image data having a different layer relationship to inspect matching between layers. SOLUTION: An inspection sample 3 of a mask or the like is irradiated with illumination light of a light source 1 and the sample 3 is scanned with an objective optical system 4 (4a and 4b ) by the operation of an XY stage 2 so that image data within an object area photographed by a photo detector 6 are sent to image memories 7a and 7b . On the other hand, a design (exposed) data 15 supplied to an image developing part 12 is housed into an image memory 7c through a data converter 14. Image data of the memories 7a -7c are positioned and synthesized by a pattern synthesization circuit 8 and sent to a fine defect detection circuit 9 and a detect detection circuit 17. For example, the fine defect detection circuit 9 compares the image data supplied from the memories 7a and 7b to detect a fine difference. For example, the defect detection circuit 17 performs an inspection based on a design rule to detect a defect. |
