发明名称 SPUTTERING TARGET FOR FORMING OPTICAL-RECORDING PROTECTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target for forming an optical-recording protective film used in the optical media such as an optical disk recording and erasing the information with a light beam and consisting of a zinc sulfide-silicon dioxide sintered compact to form a protective film in uniform thickness. SOLUTION: This sputtering target consists of a sintered compact contg. 10-30mol% >=99.999wt.% purity silicon dioxide and the balance >=99.999wt.% purity zinc sulfide and having >=90% relative density. In this case, theα-crystal zinc sulfide and theβ-crystal zinc sulfide are limited to conform to 0.3<=α/β<=0.95.
申请公布号 JPH1046328(A) 申请公布日期 1998.02.17
申请号 JP19960202561 申请日期 1996.07.31
申请人 MITSUBISHI MATERIALS CORP 发明人 MISHIMA TERUSHI;FUKUI SOICHI
分类号 C23C14/14;C23C14/06;C23C14/34;G11B7/26;(IPC1-7):C23C14/34 主分类号 C23C14/14
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