发明名称 |
SPUTTERING TARGET FOR FORMING OPTICAL-RECORDING PROTECTIVE FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for forming an optical-recording protective film used in the optical media such as an optical disk recording and erasing the information with a light beam and consisting of a zinc sulfide-silicon dioxide sintered compact to form a protective film in uniform thickness. SOLUTION: This sputtering target consists of a sintered compact contg. 10-30mol% >=99.999wt.% purity silicon dioxide and the balance >=99.999wt.% purity zinc sulfide and having >=90% relative density. In this case, theα-crystal zinc sulfide and theβ-crystal zinc sulfide are limited to conform to 0.3<=α/β<=0.95.
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申请公布号 |
JPH1046328(A) |
申请公布日期 |
1998.02.17 |
申请号 |
JP19960202561 |
申请日期 |
1996.07.31 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
MISHIMA TERUSHI;FUKUI SOICHI |
分类号 |
C23C14/14;C23C14/06;C23C14/34;G11B7/26;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/14 |
代理机构 |
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地址 |
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