发明名称 DRY DEVELOPING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a dry developing device capable of efficiently preventing the excessive developing processing of a substance to be processed. SOLUTION: This device is equipped with a developing processing chamber 6 in which the substance 5 to be processed is housed and which can be decompressed, developing gas supply means 10 and 12 supplying developing gas to the chamber 6, an exhaust system 17 exhausting gas inside the chamber 6, an air supply system 12a introducing air to the inside of the chamber 6, a load lock chamber 18 provided between an exposure device 19 and the chamber 6 and capable of being decompressed, and a carrying means 7 provided in the chamber 18 and carrying the substance 5 between the exposure device 19 and the chamber 6. Developing processing is performed by the developing gas by using the device, making the chambers 6 and 18 in a decompressed state and carrying the substance 5 to the chamber 6 by the carrying means 7. After finishing developing, the developing gas is exhausted by the system 17 and the air is introduced to the inside of the chamber 6 by the system 12.
申请公布号 JPH1055073(A) 申请公布日期 1998.02.24
申请号 JP19970120135 申请日期 1997.04.24
申请人 TOKYO ELECTRON LTD 发明人 KONISHI NOBUO;ORII TAKEHIKO
分类号 G03F7/36;H01L21/027;(IPC1-7):G03F7/36 主分类号 G03F7/36
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