发明名称 METHOD AND DEVICE FOR MEASURING TEMPERATURE OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To enable temperature measurement with lower sensitivity against the change in radiation rate of substrate by giving temperature readings in which the effective reflectance of a first probe and that of a second probe are different from each other. SOLUTION: A substrate for calibration is moved into a processing chamber to determine the effective reflectance related to first and second probes (step 160), and the temperature of the processing chamber is increased to the specified set value (step 162). Then, when the temperature reaches the desired value, the temperature of the substrate is measured by using an embedded thermocouple and two probes, and actual temperature of the substrate and measured values by two probes are given (step 164). Further, these temperatures are converted into intensity respectively, and the calibrated intensity and intensities of two probes are calculated (step 166), and then the effective reflectance values R1 and R2 of the respective probes are obtained (step 168).
申请公布号 JPH1055974(A) 申请公布日期 1998.02.24
申请号 JP19970097539 申请日期 1997.04.15
申请人 APPLIED MATERIALS INC 发明人 PEUSE BRUCE W;MINER GARY E;YAM MARK
分类号 H01L21/205;G01J5/00;G01J5/02;G01J5/04;H01L21/26;H01L21/31;H01L21/324;(IPC1-7):H01L21/26 主分类号 H01L21/205
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