| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for correcting light proximity effect capable of shortening a calculating time, and keeping correction accuracy high. SOLUTION: Judgment distance that an exposure point is influenced by light proximity effect from another exposure points in accordance with the optical condition of an exposure device to which a photomask is loaded, and an area ratio judgment reference for whether the optical proximity effect correction is needed or not are found, each side of a photomask pattern is sectioned to divided sides having length equal to or less than specified length, the ratio of the area occupied by the photomask pattern inside a circle whose radius is the judgment distance and whose center is the central point of each divided side is found by each divided side, the area ratio of each divided side is compared with the area ratio judgment reference, and whether the light proximity effect correction of each divided side is required or not is judged.</p> |
