ELECTRON-EMITTING FILM AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide an electron-emitting film, emitting uniform electrons at low field intensity and capable f being manufactured at a relatively low temperature. SOLUTION: The forming method of an electron-emitting film includes the following stages: (i) a graphite source 120 is vaporized in a cathode arc adhered device 100 to generate carbon plasma 170. (ii) a potential difference is applied between the graphite source 120 and a glass or silicone adhered substrate 130 to accelerate the carbon plasma 170 toward the adhered substrate 130. (iii) working gas is provided in the cathode arc adhered device 100. (iiii) the carbon plasma 170 is adhered onto the adhered substrate 130.