| 摘要 |
PROBLEM TO BE SOLVED: To avoid leaks at a gate passage for improving the maintainability by providing a movable cover coupled with a drive in a reaction chamber, so as to cover an opening of the gate passage at the reaction chamber, thereby preventing the deposition of reaction products on the gate. SOLUTION: A treating apparatus 91 treats a semiconductor wafer 30 in a reaction chamber 1, having an opening of a gate passage 43 and a cover 50 inside for covering the gate passage opening which prevents deposition of reaction products on the gate passage 43. The cover 50 has a shield plate 51 and a pedestal 52 mounting the shield plate 51, which is conveniently made of a stainless metal, e.g. SUS316. The pedestal 52 is not always necessary to be continuous over the entire periphery but may be provided for enabling a drive 35 to drive the cover 50. |
