发明名称 TIN OXIDE POWDER FOR HIGH DENSITY SINTERED COMPACT
摘要 PROBLEM TO BE SOLVED: To obtain stock powder giving a high density sintered compact for a target material used for producing an ITO film by incorporating a specified amt. of tin oxide powder having a specified BET specific surface area and a specified crystal diameter of primary particles and a specified particle diameter of secondary particles. SOLUTION: This tin oxide powder contains >=50% powder having 2-10m<2> /g, preferably 3-8m<2> /g BET specific surface area and >=800Åcrystal diameter of primary particles and 5-30μm particle diameter of secondary particles. This tin oxide powder is obtd. by electrolyzing metal tin as the anode at constant voltage, recovering the resultant precipitate of tin hydroxide, drying and sintering it. The powder may be separated from tin oxide powder obtd. by a neutralization-precipitation method. When the powder is mixed with specified indium powder and subjected to hot press forming, a high density ITO sintered compact whose density is >=98% of the theoretical density is obtd.
申请公布号 JPH10251019(A) 申请公布日期 1998.09.22
申请号 JP19970058978 申请日期 1997.03.13
申请人 MITSUBISHI MATERIALS CORP 发明人 MOCHIDA HIROMI;TANAKA MICHIHIRO
分类号 C01G19/00;C01G19/02;C23C14/34;(IPC1-7):C01G19/02 主分类号 C01G19/00
代理机构 代理人
主权项
地址