发明名称 CARRYING POSITION ADJUSTING MECHANISM FOR SUBSTRATE-CARRYING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide the inexpensive and highly reliable carrying position adjusting mechanism of a substrate-carrying device, which does not requive time and effect and which yields satisfactory workability. SOLUTION: This mechanism is applied to a substrate-carrying device carrying a substrate 17 to plural processing positions in a vacuum treatment device which executes various processings on the substrate 17. Substrate carriers 21 and 22 sending the substrate 17 forwards and backwards on the extension lines of axial centers, in accordance with plural processing positions and substrate reception mechanisms 31 and 32 transferring the substrate 17 between the substrate carriers 21 and 22, are provided. Furthermore, a substrate-carrying base point mechanism 11 provided with a linear motion mechanism 15, a rotary motion mechanism 14, and a substrate stand 13 on which the substrate is loaded, are provided. The substrate-receiving mechanisms 31 and 32 are arranged on the extension lines of the axial centers of the substrate carriers 21 and 22. The substrate-carrying base point mechanism 11 is arranged in an intersection position decided by straight lines which connect the substrate carriers 21 and 22 and the substrate reception mechanisms 31 and 32, which correspond to the respective processing positions, and the substrate stand 13 is provided freely movable vertically and freely turnable.
申请公布号 JPH118286(A) 申请公布日期 1999.01.12
申请号 JP19970176430 申请日期 1997.06.17
申请人 ANELVA CORP 发明人 YAMAZAKI TAKESHI
分类号 B65G49/07;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/07
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