| 摘要 |
PROBLEM TO BE SOLVED: To suppress the occurrence of faults, such as filling of fine grains by heating a gas from a space for depositing a film on a band-shaped base substrate, and providing a glow-discharging space having a gas exhausting port and a discharging means. SOLUTION: A heating means 118 for inlet gas from a gas gate 107, a gas exhaust path 119 (or gas exhausting port), a discharging electrode 111, and a common electrode 120, are provided. In a glow discharge space 121 in the vicinity of the gas exhaust path 119, the exhaust gas of a film forming space 113 for performing the film deposition is introduced on a band-shaped base substrate 101. The inflow gas from the gas gate 107 is heated before entering the glow discharging space. At the same time, high-frequency electric power is applied on a discharging electrode 120 provided in the vicinity of the exhaust path 119. Therefore, the plasma energy is not rapidly stopped in the vicinity of the exhausting path 119, and fine grains are hard to be deposited in the vicinity of the exhaust path 119 of the glow discharge chamber. Thus, occurrence of faults such as filling of fine grains in the exhausting system can be suppressed. |
