| 摘要 |
PROBLEM TO BE SOLVED: To manage with high accuracy the baseline of a projecting exposure device having an off-axis alignment system. SOLUTION: A reference mark FM2 to be aligned with reticle marks RMI, RM2 and a reference mark FM to be aligned by an off-axis system are provided on a reference plate EP on a wafer stage WST, and the two reference marks FM1 , FM2 are measured at almost the same time while the stage is stationary. At that stage position, an interferometer used during exposure and another interferometer used during off-axis alignment are preset to the same measurement. |
