| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method and a production device of the synthetic quartz glass capable of forming a quartz glass ingot having a larger diameter than a target diameter and good in homogeneity of refractive index. SOLUTION: The synthetic quartz glass ingot IG is formed on an upper surface of the target 4 by ejecting a gaseous silicon compd., an oxygen- containing gas and a hydrogen-containing gas from a burner 5 provided by directing its ejecting port to an upper surface of the target 4 and also a lower part of the ingot IG is forcedly cooled during the ingot IG is formed on the upper surface of the target 4. In order to cool forcedly, a passage hole 11 is provided drillingly at an inside of the target 4, and a cooling gas is infected from a lower part side of the passage hole 11 and spouted to an upper part side of the target 4. |
