摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a water soluble photosensitive resin composition, which dispenses with a dying process to simplify the processes, enables to form a pattern by photolithography, has high heat resistance and high transparency and is unnecessitated in an organic solvent and harmless to environment, a photosensitive coloring composition, a color filter using the same and the producing method. SOLUTION: The photosensitive resin composition contains a resin component produced by incorporating at least a monomer expressed by formula (1) to polymerize and a photosensitizing agent. Where, R<1> represents one of H, Cn H2n+1 (1<=n<=6), an aromatic or a cycloring and R<2> represents one of Cn H2n+1 (1<=n<=6), an aromatic or a cycloring.</p> |