发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE COLORING COMPOSITION, COLOR FILTER USING THE COLORING COMPOSITION AND ITS PRODUCTION
摘要 <p>PROBLEM TO BE SOLVED: To obtain a water soluble photosensitive resin composition, which dispenses with a dying process to simplify the processes, enables to form a pattern by photolithography, has high heat resistance and high transparency and is unnecessitated in an organic solvent and harmless to environment, a photosensitive coloring composition, a color filter using the same and the producing method. SOLUTION: The photosensitive resin composition contains a resin component produced by incorporating at least a monomer expressed by formula (1) to polymerize and a photosensitizing agent. Where, R<1> represents one of H, Cn H2n+1 (1<=n<=6), an aromatic or a cycloring and R<2> represents one of Cn H2n+1 (1<=n<=6), an aromatic or a cycloring.</p>
申请公布号 JPH11352690(A) 申请公布日期 1999.12.24
申请号 JP19980162582 申请日期 1998.06.10
申请人 TOPPAN PRINTING CO LTD 发明人 NAGATA ERIKO;TAMURA AKIRA;TANI MIZUHITO
分类号 G03F7/004;C08L33/12;C08L39/00;G02B5/20;G03F7/033;(IPC1-7):G03F7/033 主分类号 G03F7/004
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