发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a diode capable of preventing occurrence of the phenomenon in which a field limiting innermost peripheral layer is broken at reverse biasing. SOLUTION: An anode metal electrode 8, composed of aluminum is formed in a region further in than an anode layer 3 formed on a main surface of a semiconductor substrate 1. Accordingly, an impurity diffused region 3 from an innermost peripheral face of a field limiting innermost periphery 4 to an outermost peripheral face of the anode electrode metal electrode 8 can be used as an electrical resistor. Therefore, it is possible to reduce holes density distributing from the lower side of the field limiting innermost periphery 4 toward a cathode layer 2 at the time of forward bias. As a result, it is possible to restrict the occurrence of a recovery current flowing locally largely towards the lower face of the field limiting innermost peripheral layer 4 at reverse biasing.
申请公布号 JP2000049360(A) 申请公布日期 2000.02.18
申请号 JP19980213891 申请日期 1998.07.29
申请人 MITSUBISHI ELECTRIC CORP 发明人 AONO SHINJI;HARADA MANA
分类号 H01L29/70;H01L29/06;H01L29/861;(IPC1-7):H01L29/861 主分类号 H01L29/70
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