| 摘要 |
<p>A pattern formation for partly removing a second insulating film (6) to make an opening so as to lay a scanning signal wiring (2) and a video signal wiring (5) and a pattern formation for partly removing a first insulating film (3) to make an opening so as to carry out layer conversion of the layer for the scanning signal wiring (2) and the layer for the video signal wiring (5) are simultaneously conducted. Hence the number of cycles in the photolithography processing of a TFT array process is five. The layer for the scanning signal wiring (2) and the layer for the video signal wiring (5) are electrically interconnected through the layer for a pixel electrode (7).</p> |
