发明名称 |
ENHANCED DRIVABILITY DRIVER TRANSISTOR STRUCTURE AND INCREASED CURRENT SUPPLY TRANSISTOR STRUCTURE |
摘要 |
PURPOSE: An driver transistor structure having enhanced driving characteristic and an increased current supply transistor structure is provided to without increasing active area by a ring-shaped layout of an IGFET element. CONSTITUTION: The driver transistor structure having enhanced driving characteristic comprises: an active semiconductor area of a substrate; a multitude of conductive patterns arranged to the active semiconductor area; and each conductive pattern having one more ring-shaped portion, the ring-shaped portion forming a gate conductive material of an Insulated Gate Field Effect Transistor(IGFET)(42). The increased current supply transistor structure comprises: an active semiconductor area of the substrate; and a multitude of IGFETs formed by the ring-shaped portion of the conductive material pattern arranged to the active semiconductor area; and the IGFET having a source (46) and a drain terminal(48).
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申请公布号 |
KR20000017482(A) |
申请公布日期 |
2000.03.25 |
申请号 |
KR19990035144 |
申请日期 |
1999.08.24 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;SIEMENS AKTIENGESELLSCHAFT |
发明人 |
FANISHEMIT HAINTS;NETIS DMITRI |
分类号 |
H01L27/06;G11C11/407;H01L21/8234;H01L21/8242;H01L27/088;H01L27/10;H01L27/105;H01L27/108;(IPC1-7):H01L27/06 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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