发明名称 ENHANCED DRIVABILITY DRIVER TRANSISTOR STRUCTURE AND INCREASED CURRENT SUPPLY TRANSISTOR STRUCTURE
摘要 PURPOSE: An driver transistor structure having enhanced driving characteristic and an increased current supply transistor structure is provided to without increasing active area by a ring-shaped layout of an IGFET element. CONSTITUTION: The driver transistor structure having enhanced driving characteristic comprises: an active semiconductor area of a substrate; a multitude of conductive patterns arranged to the active semiconductor area; and each conductive pattern having one more ring-shaped portion, the ring-shaped portion forming a gate conductive material of an Insulated Gate Field Effect Transistor(IGFET)(42). The increased current supply transistor structure comprises: an active semiconductor area of the substrate; and a multitude of IGFETs formed by the ring-shaped portion of the conductive material pattern arranged to the active semiconductor area; and the IGFET having a source (46) and a drain terminal(48).
申请公布号 KR20000017482(A) 申请公布日期 2000.03.25
申请号 KR19990035144 申请日期 1999.08.24
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;SIEMENS AKTIENGESELLSCHAFT 发明人 FANISHEMIT HAINTS;NETIS DMITRI
分类号 H01L27/06;G11C11/407;H01L21/8234;H01L21/8242;H01L27/088;H01L27/10;H01L27/105;H01L27/108;(IPC1-7):H01L27/06 主分类号 H01L27/06
代理机构 代理人
主权项
地址