发明名称 |
NON-LINEAR OPTICAL SILICA THIN FILM FABRICATING METHOD AND NON-LINEAR OPTICAL SILICA DEVICE |
摘要 |
PURPOSE: A method for fabricating a non-linear optical silica thin film is provided to irradiate polar particles during formation of the thin film and thereby polarization orientate the thin film. CONSTITUTION: The method comprises the steps of forming a non-linear optical silica thin film under radiation of polar particles and polarization orientating the optical silica thin film. The formation of the non-linear optical silica thin film is repeated under radiation of neutral particles or non-radiation to form a plurality of areas with different substrate orientations in the thickness direction of the silica thin film. The non-linear optical silica thin film comprises GiO2-GeO2 as a principal component.
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申请公布号 |
KR20000016845(A) |
申请公布日期 |
2000.03.25 |
申请号 |
KR19990011727 |
申请日期 |
1999.04.03 |
申请人 |
TOYOTA JIDOSHA KABUSHIKI KAISHA |
发明人 |
HASEGAWA HIROSHI;KOMEDA OSAMU |
分类号 |
G02F1/35;C03C17/245;C23C14/10;G02F1/355;G02F1/37;(IPC1-7):C03C4/00 |
主分类号 |
G02F1/35 |
代理机构 |
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