发明名称 NON-LINEAR OPTICAL SILICA THIN FILM FABRICATING METHOD AND NON-LINEAR OPTICAL SILICA DEVICE
摘要 PURPOSE: A method for fabricating a non-linear optical silica thin film is provided to irradiate polar particles during formation of the thin film and thereby polarization orientate the thin film. CONSTITUTION: The method comprises the steps of forming a non-linear optical silica thin film under radiation of polar particles and polarization orientating the optical silica thin film. The formation of the non-linear optical silica thin film is repeated under radiation of neutral particles or non-radiation to form a plurality of areas with different substrate orientations in the thickness direction of the silica thin film. The non-linear optical silica thin film comprises GiO2-GeO2 as a principal component.
申请公布号 KR20000016845(A) 申请公布日期 2000.03.25
申请号 KR19990011727 申请日期 1999.04.03
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 HASEGAWA HIROSHI;KOMEDA OSAMU
分类号 G02F1/35;C03C17/245;C23C14/10;G02F1/355;G02F1/37;(IPC1-7):C03C4/00 主分类号 G02F1/35
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