发明名称 CHEMICAL MECHANICAL POLISHING CONDITIONER
摘要 <p>A conditioner head uses a fluid purge system to prevent debris from entering openings in the conditioner head and causing deterioration of bearings and other moving components in the conditioner head. The fluid may be a gas, such as nitrogen, or a liquid, such as water or reactive solvents.</p>
申请公布号 WO2000018542(A1) 申请公布日期 2000.04.06
申请号 US1999022037 申请日期 1999.09.22
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