METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE HAVING CYLINDRICAL CAPACITOR

摘要

PURPOSE: A method for fabricating a semiconductor device having a cylindrical capacitor is provided to reduce the fault of the semiconductor device by preventing a conductive spacer from separating from a scribe line or a wafer edge. CONSTITUTION: After forming a transistor on a cell area of a semiconductor substrate(100), a contact plug(16) is formed on a contact area of a capacitor storage electrode. A pattern is formed by etching an insulation layer and a first conductive layer(24). A second conductive layer is then formed. Then second conductive layer is etched to form a spacer(26) on the first conductive layer(24) so that a cylindrical storage electrode is provided. A photo-sensitive pattern(30) is coated on the cell area. Then, the spacer(26) existed in a scribe area or a wafer edge area is removed by an etching process.