| 摘要 |
<p>The present invention relates to a system and a method for microlithographic writing on photosensitive substrates, and specially printing of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. More specific, the method according to the invention comprises the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter the support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the position where the writing was interrupted when the error condition has ceased to exist.</p> |
