发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device with a fuse structure, wherein a laser irradiated at copper fuse melting gives less damage to a silicon substrate at the lower part of copper fuse. SOLUTION: With a light-absorbing layer 4 of such material as of higher light absorptivity than a copper wiring layer provided at the upper part of a copper fuse layer 3, the light absorbed in the light absorbing layer 4 is conveyed to a copper wiring layer below the light absorbing layer 4 by thermal conduction, and further is conveyed to a barrier metal layer below it, for melting of a copper fuse even when a widely used infrared region wavelength laser is used. With a guard layer provided under the fuse layer 3, the damages to a silicon substrate, which arises at irradiating visible region wavelength laser, are suppressed, so that a copper fuse is melted even with a visible region wavelength laser with high light absorptivity with respect to copper.
申请公布号 JP2000208635(A) 申请公布日期 2000.07.28
申请号 JP19990010647 申请日期 1999.01.19
申请人 MITSUBISHI ELECTRIC CORP 发明人 IDO YASUHIRO;IWAMOTO TAKESHI;TOYODA RUI
分类号 H01L21/3205;H01L21/82;H01L21/822;H01L23/52;H01L23/525;H01L23/532;H01L27/04;H01L27/10;(IPC1-7):H01L21/82;H01L21/320 主分类号 H01L21/3205
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