| 摘要 |
PROBLEM TO BE SOLVED: To produce a plurality of types of patterns with good accuracy upon carrying out a side-wall method using an organic material as a core material.SOLUTION: A pattern forming method includes steps of: preparing a substrate having a first region and a second region; forming a core material pattern including an organic material in the first region; forming a first mask in the first region and in the second region to cover the core material pattern; applying a negative resist on the first mask to form a resist layer and irradiating the resist layer in a predetermined region of the second region with chemical rays to form a second mask; etching the first mask in the first region and in the second region via the second mask to partially remove the first mask so as to leave the first mask on a side wall of the core material pattern and under the second mask; removing the core material pattern to form a side-wall pattern in the first region; and etching the substrate via the side-wall pattern and the first mask that is present under the second mask to form a first concavo-convex pattern in the first region and a second concavo-convex pattern in the second region. |
